Installation for etching and deposition of thin-film structures by a fast neutral particle beam

Installation for etching and deposition of thin-film structures by a fast neutral particle beam An installation for etching and depositing thin-film structures equipped with a Neitral-L original source, which forms a ribbon beam of rapid neutral particles obtained when using various working gases, is developed. A system for the source neutralization and separation ensures hundred-percent beam neutralization. In order to increase the treatment uniformity of the substrates, a system with a programmable controller of the reciprocal motion of the substrate holder relative to the ribbon beam is built-in into the processing chamber of the installation. The technical possibilities of the installation are investigated experimentally. The etching and deposition processes of materials are performed when using various working gases. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Installation for etching and deposition of thin-film structures by a fast neutral particle beam

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Publisher
Pleiades Publishing
Copyright
Copyright © 2015 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S106373971505008X
Publisher site
See Article on Publisher Site

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