Installation for etching and deposition of thin-film structures by a fast neutral particle beam

Installation for etching and deposition of thin-film structures by a fast neutral particle beam An installation for etching and depositing thin-film structures equipped with a Neitral-L original source, which forms a ribbon beam of rapid neutral particles obtained when using various working gases, is developed. A system for the source neutralization and separation ensures hundred-percent beam neutralization. In order to increase the treatment uniformity of the substrates, a system with a programmable controller of the reciprocal motion of the substrate holder relative to the ribbon beam is built-in into the processing chamber of the installation. The technical possibilities of the installation are investigated experimentally. The etching and deposition processes of materials are performed when using various working gases. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Installation for etching and deposition of thin-film structures by a fast neutral particle beam

Loading next page...
 
/lp/springer_journal/installation-for-etching-and-deposition-of-thin-film-structures-by-a-v8NIO7wAp0
Publisher
Springer Journals
Copyright
Copyright © 2015 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S106373971505008X
Publisher site
See Article on Publisher Site

Abstract

An installation for etching and depositing thin-film structures equipped with a Neitral-L original source, which forms a ribbon beam of rapid neutral particles obtained when using various working gases, is developed. A system for the source neutralization and separation ensures hundred-percent beam neutralization. In order to increase the treatment uniformity of the substrates, a system with a programmable controller of the reciprocal motion of the substrate holder relative to the ribbon beam is built-in into the processing chamber of the installation. The technical possibilities of the installation are investigated experimentally. The etching and deposition processes of materials are performed when using various working gases.

Journal

Russian MicroelectronicsSpringer Journals

Published: Sep 2, 2015

References

You’re reading a free preview. Subscribe to read the entire article.


DeepDyve is your
personal research library

It’s your single place to instantly
discover and read the research
that matters to you.

Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.

All for just $49/month

Explore the DeepDyve Library

Search

Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly

Organize

Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.

Access

Get unlimited, online access to over 18 million full-text articles from more than 15,000 scientific journals.

Your journals are on DeepDyve

Read from thousands of the leading scholarly journals from SpringerNature, Elsevier, Wiley-Blackwell, Oxford University Press and more.

All the latest content is available, no embargo periods.

See the journals in your area

DeepDyve

Freelancer

DeepDyve

Pro

Price

FREE

$49/month
$360/year

Save searches from
Google Scholar,
PubMed

Create lists to
organize your research

Export lists, citations

Read DeepDyve articles

Abstract access only

Unlimited access to over
18 million full-text articles

Print

20 pages / month

PDF Discount

20% off