Access the full text.
Sign up today, get DeepDyve free for 14 days.
W. Badawy, F. Al-Kharafi, A. El-Azab (1999)
Electrochemical behaviour and corrosion inhibition of Al, Al-6061 and Al–Cu in neutral aqueous solutionsCorrosion Science, 41
R. Solmaz, E. Şahin, Ali Döner, G. Kardaş (2011)
The investigation of synergistic inhibition effect of rhodanine and iodide ion on the corrosion of copper in sulphuric acid solutionCorrosion Science, 53
E. Mccafferty, N. Hackerman (1972)
Double Layer Capacitance of Iron and Corrosion Inhibition with Polymethylene DiaminesJournal of The Electrochemical Society, 119
A. Fiala, A. Chibani, A. Darchen, A. Boulkamh, K. Djebbar (2007)
Investigations of the inhibition of copper corrosion in nitric acid solutions by ketene dithioacetal derivativesApplied Surface Science, 253
M. Baumgärtner, H. Kaesche (1990)
Aluminum pitting in chloride solutions: morphology and pit growth kineticsCorrosion Science, 31
W. Carroll, C. Breslin (1991)
Stability of passive films formed on aluminium in aqueous halide solutionsBritish Corrosion Journal, 26
K. Khaled, S. Fadlallah, B. Hammouti (2009)
Some benzotriazole derivatives as corrosion inhibitors for copper in acidic medium: Experimental and quantum chemical molecular dynamics approachMaterials Chemistry and Physics, 117
S. Sayed, M. El-Deab, B. El-Anadouli, B. Ateya (2003)
Synergistic Effects of Benzotriazole and Copper Ions on the Electrochemical Impedance Spectroscopy and Corrosion Behavior of Iron in Sulfuric AcidJournal of Physical Chemistry B, 107
N. Khalil (2003)
Quantum chemical approach of corrosion inhibitionElectrochimica Acta, 48
S. Abedin (2001)
Role of chromate, molybdate and tungstate anions on the inhibition of aluminiumin chloride solutionsJournal of Applied Electrochemistry, 31
G. Gomma, M. Wahdan (1994)
Effect of temperature on the acidic dissolution of copper in the presence of amino acidsMaterials Chemistry and Physics, 39
F. Bentiss, M. Lagrenée, M. Traisnel, J. Hornez (1999)
The corrosion inhibition of mild steel in acidic media by a new triazole derivativeCorrosion Science, 41
Peng Li, Jianyi Lin, K. Tan, J. Lee (1997)
Electrochemical impedance and X-ray photoelectron spectroscopic studies of the inhibition of mild steel corrosion in acids by cyclohexylamineElectrochimica Acta, 42
M. Mihit, K. Laarej, H. Makarim, L. Bazzi, R. Salghi, B. Hammouti (2010)
Study of the Inhibition of the Corrosion of Copper and Zinc in HNO3 Solution by Electrochemical Technique and Quantum Chemical CalculationsArabian Journal of Chemistry, 3
W. Pietro, M. Francl, W. Hehre, D. Defrees, J. Pople, J. Binkley (1982)
Self-consistent molecular orbital methods. 24. Supplemented small split-valence basis sets for second-row elementsJournal of the American Chemical Society, 104
C. Brett (1990)
The application of electrochemical impedance techniques to aluminium corrosion in acidic chloride solutionJournal of Applied Electrochemistry, 20
J. Telegdi, H. Otmaèiæ-Æurkoviæ, K. Marušiæ, F. Al-Taher, E. Stupnišec-Lisac, E. Kálmán (2007)
Inhibition of Copper Corrosion by self Assembled
(1088)
T
S. Frers, M. Stefenel, C. Mayer, T. Chierchie (1990)
AC-Impedance measurements on aluminium in chloride containing solutions and below the pitting potentialJournal of Applied Electrochemistry, 20
A. Lalitha, S. Ramesh, S. Rajeswari (2005)
Surface protection of copper in acid medium by azoles and surfactantsElectrochimica Acta, 51
A. El-Shafei, S. el-Maksoud, A. Fouda (2004)
The role of indole and its derivatives in the pitting corrosion of Al in neutral chloride solutionCorrosion Science, 46
F. AI-Kharafi, W. Badawy (1996)
Stability of anodically passivated AI, AI-eu, AI-6061 and AI-7075 in nitric acid and nitric acid solutions containing chlorideIndian Journal of Chemical Technology, 3
Yang Chao-Cheng (1994)
Electrodeposition of aluminum in molten AlCl3-n-butylpyridinium chloride electrolyteMaterials Chemistry and Physics, 37
G. Moretti, Francesca Guidi (2002)
Tryptophan as copper corrosion inhibitor in 0.5 M aerated sulfuric acidCorrosion Science, 44
P. Cabot, F. Centellas, J. Garrido, E. Pérez, H. Vidal (1991)
ELECTROCHEMICAL STUDY OF ALUMINIUM CORROSION IN ACID CHLORIDE SOLUTIONSElectrochimica Acta, 36
L. Tomcsányi, K. Varga, I. Bartík, H. Horányi, E. Maleczki (1989)
Electrochemical study of the pitting corrosion of aluminium and its alloys—II. Study of the interaction of chloride ions with a passive film on aluminium and initiation of pitting corrosionElectrochimica Acta, 34
K. Dobbs, W. Hehre (1986)
Molecular orbital theory of the properties of inorganic and organometallic compounds 4. Extended basis sets for third‐and fourth‐row, main‐group elementsJournal of Computational Chemistry, 7
S. Rehim, O. Hazzazi, Mohammed Amin, K. Khaled (2008)
On the corrosion inhibition of low carbon steel in concentrated sulphuric acid solutions. Part I: Chemical and electrochemical (AC and DC) studiesCorrosion Science, 50
K. Khaled, M. Amin (2009)
Dry and wet lab studies for some benzotriazole derivatives as possible corrosion inhibitors for copper in 1.0 M HNO3Corrosion Science, 51
S. Rehim, H. Hassan, M. Amin (2002)
Corrosion and corrosion inhibition of Al and some alloys in sulphate solutions containing halide ions investigated by an impedance techniqueApplied Surface Science, 187
B. Samuels, K. Sotoudeh, R. Foley (1981)
Inhibition and Acceleration of Aluminum CorrosionCorrosion, 37
(1973)
Theoretical aspects of corrosion inhibitors and inhibition, in Corrosion inhibitors
El-Sayed Sherif, Su-Moon Park (2006)
Inhibition of copper corrosion in acidic pickling solutions by N-phenyl-1,4-phenylenediamineElectrochimica Acta, 51
L. Young, H. Liebhafsky (1962)
Anodic Oxide FilmsPhysics Today, 15
(1986)
Forr, Mater
A. Fouda, M. Gouda, S. El‐Rahman (2000)
2-Hydroxyacetophenone-aroyl Hydrazone Derivatives as Corrosion Inhibitors for Copper Dissolution in Nitric Acid SolutionBulletin of The Korean Chemical Society, 21
W. Qafsaoui, C. Blanc, N. Pébère, H. Takenouti, A. Srhiri, G. Mankowski (2002)
Quantitative characterization of protective films grown on copper in the presence of different triazole derivative inhibitorsElectrochimica Acta, 47
Hong Ju, Zhenming Kai, Yan Li (2008)
Aminic nitrogen-bearing polydentate Schiff base compounds as corrosion inhibitors for iron in acidic media: A quantum chemical calculationCorrosion Science, 50
Manjula Spah, D. Spah, K. Singh, Vibha Gupta, Ho-Jun Song, Jinwon Park (2008)
Effect of Solvents on the Corrosion Inhibition of Copper by 1,2,3-BenzotriazoleJournal of Solution Chemistry, 37
M. White, H. Leidheiser, G. Koch (1986)
A laboratory evaluation technique for predicting the behavior of organic coatings in FGD systemsMaterials Performance, 25
I. Lukovits, E. Kálmán, F. Zucchi (2001)
Corrosion Inhibitors—Correlation between Electronic Structure and EfficiencyCorrosion, 57
J. Binkley, J. Pople, W. Hehre (2002)
Self-consistent molecular orbital methods. 21. Small split-valence basis sets for first-row elementsChemInform, 11
G. Quartarone, M. Battilana, L. Bonaldo, T. Tortato (2008)
Investigation of the inhibition effect of indole-3-carboxylic acid on the copper corrosion in 0.5 M H2SO4Corrosion Science, 50
N. Sato (1995)
The stability of localized corrosionCorrosion Science, 37
C. Brett, I. Gomes, J. Martins (1994)
The electrochemical behaviour and corrosion of aluminium in chloride media. The effect of inhibitor anionsCorrosion Science, 36
A. Becke (1993)
Density-functional thermochemistry. III. The role of exact exchangeJournal of Chemical Physics, 98
P. Natishan, E. Mccafferty, G. Hubler (1988)
Surface Charge Considerations in the Pitting of Ion‐Implanted AluminumJournal of The Electrochemical Society, 135
Inhibition of corrosion of copper in 2M HNO3 by N-1-naphthylethylenediamine dihydrochloride monomethanolate (N-NEDHME) has been studied by use of weight loss, electrochemical polarization, and electrochemical impedance spectroscopy (EIS) measurements. The result obtained reveal that this organic compound is a very good inhibitor and its inhibition efficiency increases with increasing concentration, reaching 94% at 10−3 M at 303 K. The potentiodynamic polarization study indicated that this compound acts as a cathodic type corrosion inhibitor. EIS results indicate that the change in the impedance properties (R t and C dl) with concentration of inhibitor was because of the formation of a protective layer on the surface of copper. Quantum chemical calculations using DFT at the B3LYP/6-31G* level of theory was further used to calculate some electronic properties of the molecule in order to ascertain any correlation between the inhibitive effect and molecular structure of N-NEDHME. The effect of temperature between 303 and 343 K and calculation of activation data will be discussed in Part 2.
Research on Chemical Intermediates – Springer Journals
Published: Dec 23, 2011
Access the full text.
Sign up today, get DeepDyve free for 14 days.