Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As–Te Chalcogenide Films

Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As–Te... First time the method of plasma-enhanced chemical vapor deposition was used for preparation of As–Te chalcogenide films of different chemical and phase composition. The samples were synthesized via direct interaction of arsenic and tellurium vapors into low-temperature non-equilibrium RF (40 MHz) plasma discharge at reduced pressure (0.1 Torr). The plasma parameters such as temperature and concentration of electrons were measured by moving double probe diagnostic system. The dependence of solid phase radial distribution on plasma characteristics was established. Besides, the phase and structural evolution of As–Te films based on equilibrium coexistence of two phases (AsTe and As2Te3) and implemented by changing of the ratio of the initial substances in gas phase has been studied and discussed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Plasma Chemistry and Plasma Processing Springer Journals

Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As–Te Chalcogenide Films

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Publisher
Springer US
Copyright
Copyright © 2017 by Springer Science+Business Media, LLC
Subject
Chemistry; Inorganic Chemistry; Classical Mechanics; Characterization and Evaluation of Materials; Mechanical Engineering
ISSN
0272-4324
eISSN
1572-8986
D.O.I.
10.1007/s11090-017-9830-x
Publisher site
See Article on Publisher Site

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