In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospects, Part IV

In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate... This paper is the final part of a review of which parts I–III were published in Mikroelektronika, 2001, vol. 30, nos. 2, 3, and 5, respectively. The control of plasma processes on the basis of the real-time characterization of the plasma and the wafer surface is discussed. The research on the interpretation of in situdata at high noise levels is reviewed. The architecture, modeling, and simulation of plasma-reactor controllers are covered. The progress in spatially resolved plasma characterization, including recent advances in computerized emission tomography, is surveyed from the standpoint of the optimization of plasma sources and fabrication processes in the microelectronic industry. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospects, Part IV

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2001 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1012581113631
Publisher site
See Article on Publisher Site

Abstract

This paper is the final part of a review of which parts I–III were published in Mikroelektronika, 2001, vol. 30, nos. 2, 3, and 5, respectively. The control of plasma processes on the basis of the real-time characterization of the plasma and the wafer surface is discussed. The research on the interpretation of in situdata at high noise levels is reviewed. The architecture, modeling, and simulation of plasma-reactor controllers are covered. The progress in spatially resolved plasma characterization, including recent advances in computerized emission tomography, is surveyed from the standpoint of the optimization of plasma sources and fabrication processes in the microelectronic industry.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 10, 2004

References

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