Formation of thin-film HfO2/Si(100) structures by high-frequency magnetron sputtering

Formation of thin-film HfO2/Si(100) structures by high-frequency magnetron sputtering The results of X-ray structural investigations and current-voltage measurements of the HfO2/Si(100) structures are presented. The HfO2 films of 50 nm thickness were deposited in a Si substrate by high-frequency magnetron sputtering in argon plasma and subjected to rapid thermal annealing at 500, 700, and/or 800°C in the Ar or O2 ambient. It is shown that the HfO2 films become polycrystalline after annealing. The presence of various crystalline phases in them and the form of the I–V characteristics of the Al/HfO2/Si(100) test structures strongly depend on the growth conditions and the gas ambient during the rapid thermal annealing. It is established that the HfO2 films deposited at a high-frequency bias at a substrate of −7 V during the growth and then passed through rapid thermal treatment in the O2 ambient at 700°C have the highest breakdown voltages. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Formation of thin-film HfO2/Si(100) structures by high-frequency magnetron sputtering

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2011 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739711060096
Publisher site
See Article on Publisher Site

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