Formation and some properties of chromium oxide nanolayers on semiconductors

Formation and some properties of chromium oxide nanolayers on semiconductors Ultrathin chromium oxide layers (nanostructures) are synthesized by molecular laying (atomic layer deposition) on the (100)-oriented Si surface and the (100)- and (110)-oriented GaAs surfaces. The influence of technological conditions on the composition and basic regular trends in the formation of the layers is established. Some of the dielectric properties of the chromium oxide nanostructures and the quality of the semiconductor-insulator interface are assessed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Formation and some properties of chromium oxide nanolayers on semiconductors

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2008 by MAIK Nauka
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739708060024
Publisher site
See Article on Publisher Site

Abstract

Ultrathin chromium oxide layers (nanostructures) are synthesized by molecular laying (atomic layer deposition) on the (100)-oriented Si surface and the (100)- and (110)-oriented GaAs surfaces. The influence of technological conditions on the composition and basic regular trends in the formation of the layers is established. Some of the dielectric properties of the chromium oxide nanostructures and the quality of the semiconductor-insulator interface are assessed.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 8, 2008

References

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