Formation and dielectric properties of nanolayers of tantalum and aluminum oxides

Formation and dielectric properties of nanolayers of tantalum and aluminum oxides The results of investigations of processes for the formation of nanolayers of tantalum and aluminum oxides and multilayer compositions obtained by molecular layering onto silicon (100) and aluminum surfaces are presented. The conditions of the layer-by-layer growth of oxide structures and low-dimensional multilayer systems with alternating regions of the mentioned oxides are determined. The dielectric parameters of the synthesized nanostructures are evaluated. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Formation and dielectric properties of nanolayers of tantalum and aluminum oxides

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Publisher
Springer US
Copyright
Copyright © 2014 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739713060048
Publisher site
See Article on Publisher Site

Abstract

The results of investigations of processes for the formation of nanolayers of tantalum and aluminum oxides and multilayer compositions obtained by molecular layering onto silicon (100) and aluminum surfaces are presented. The conditions of the layer-by-layer growth of oxide structures and low-dimensional multilayer systems with alternating regions of the mentioned oxides are determined. The dielectric parameters of the synthesized nanostructures are evaluated.

Journal

Russian MicroelectronicsSpringer Journals

Published: Jan 30, 2014

References

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