Techniques have been developed for forming integrated graphene structures on a silicon wafer surface by mechanical and chemical splitting and chemical vapor deposition. The imperfection of the fabricated structures has been investigated by atomic force microscopy and X-ray diffraction. For the aerosol technique of deposition of mechanically spit graphite, the regularity has been revealed in the reduction of the graphene sheet size with increasing pressure. The correlation of the topographic defects of graphene material and the structural defects observed in X-ray diffraction patterns is demonstrated.
Russian Microelectronics – Springer Journals
Published: Nov 14, 2014
It’s your single place to instantly
discover and read the research
that matters to you.
Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.
All for just $49/month
Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly
Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.
All the latest content is available, no embargo periods.
“Whoa! It’s like Spotify but for academic articles.”@Phil_Robichaud