Evolution of the Co–N/Ti/Si System in Magnetron Sputtering of Co onto a Heated Ti/Si(100) Substrate

Evolution of the Co–N/Ti/Si System in Magnetron Sputtering of Co onto a Heated Ti/Si(100)... The surface-diffusion interaction is studied experimentally between cobalt and a heated Ti/Si(100) substrate under reactive magnetron sputtering in an argon–nitrogen atmosphere. A model is proposed that accounts for the nature of silicide formation in the Co/Ti/Si system by volume and surface-diffusion reactions between cobalt and the substrate. It is shown that the diffusion of cobalt into the silicon is impeded by the TiSi x layer to a far greater extent than by the Ti layer. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Evolution of the Co–N/Ti/Si System in Magnetron Sputtering of Co onto a Heated Ti/Si(100) Substrate

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2004 by MAIK “Nauka/Interperiodica”
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/B:RUMI.0000011093.63543.a8
Publisher site
See Article on Publisher Site

Abstract

The surface-diffusion interaction is studied experimentally between cobalt and a heated Ti/Si(100) substrate under reactive magnetron sputtering in an argon–nitrogen atmosphere. A model is proposed that accounts for the nature of silicide formation in the Co/Ti/Si system by volume and surface-diffusion reactions between cobalt and the substrate. It is shown that the diffusion of cobalt into the silicon is impeded by the TiSi x layer to a far greater extent than by the Ti layer.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 18, 2004

References

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