Emission tomography of plasma in technological reactors of microelectronics

Emission tomography of plasma in technological reactors of microelectronics Optical emission tomography is a promising method for the analysis of the lateral distribution of the particle density in plasma of plasma-chemical reactors, which is very critical in technological processes of microelectronics on large-diameter wafers. In this work, we propose an algorithm of the tomographic reconstruction of the 2D distribution of plasma components in the cross section of the reactor by their spectrally allowed optical emission at an extremely small number of recording angles. The geometry of the collection of the tomographic data was selected so that it would be compatible with the existing industrial types of plasma reactors. The algorithm is tested for artificially created phantoms in a physical model experiment and is applied to an actual plasma chemical reactor. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Emission tomography of plasma in technological reactors of microelectronics

Loading next page...
 
/lp/springer_journal/emission-tomography-of-plasma-in-technological-reactors-of-S8bSxALYxl
Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2009 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739709020036
Publisher site
See Article on Publisher Site

Abstract

Optical emission tomography is a promising method for the analysis of the lateral distribution of the particle density in plasma of plasma-chemical reactors, which is very critical in technological processes of microelectronics on large-diameter wafers. In this work, we propose an algorithm of the tomographic reconstruction of the 2D distribution of plasma components in the cross section of the reactor by their spectrally allowed optical emission at an extremely small number of recording angles. The geometry of the collection of the tomographic data was selected so that it would be compatible with the existing industrial types of plasma reactors. The algorithm is tested for artificially created phantoms in a physical model experiment and is applied to an actual plasma chemical reactor.

Journal

Russian MicroelectronicsSpringer Journals

Published: Mar 28, 2009

References

You’re reading a free preview. Subscribe to read the entire article.


DeepDyve is your
personal research library

It’s your single place to instantly
discover and read the research
that matters to you.

Enjoy affordable access to
over 12 million articles from more than
10,000 peer-reviewed journals.

All for just $49/month

Explore the DeepDyve Library

Unlimited reading

Read as many articles as you need. Full articles with original layout, charts and figures. Read online, from anywhere.

Stay up to date

Keep up with your field with Personalized Recommendations and Follow Journals to get automatic updates.

Organize your research

It’s easy to organize your research with our built-in tools.

Your journals are on DeepDyve

Read from thousands of the leading scholarly journals from SpringerNature, Elsevier, Wiley-Blackwell, Oxford University Press and more.

All the latest content is available, no embargo periods.

See the journals in your area

DeepDyve Freelancer

DeepDyve Pro

Price
FREE
$49/month

$360/year
Save searches from
Google Scholar,
PubMed
Create lists to
organize your research
Export lists, citations
Read DeepDyve articles
Abstract access only
Unlimited access to over
18 million full-text articles
Print
20 pages/month
PDF Discount
20% off