Res. Chem. Intermed.
, Vol. 27, No. 7,8, pp. 699–707 (2001)
Electron attachment processes in gas mixtures
W. BARSZCZEWSKA, A. ROSA, J. KOPYRA and I. SZAMREJ
Chemistry Department, University of Podlasie, Siedlce, Poland
Abstract—Electron attachment processes in the mixture of haloethanes with carbon dioxide and
nitrogen have been investigated. The rate constants for two-body processes have been measured.
A link between rate constants and electron polarizabilities was demonstrated.
Electron attachment in the gas phase plays an important role in many elds of
research, including discharges, gaseous dielectrics and the chemistry of the at-
mosphere. These processes have been studied extensively within the last three
decades [1–3]. They are of fundamental importance for understanding electron – mo-
lecule interactions and the mechanism of negative ion-formation.
Recent studies of electron attachment have revealed that thermal electrons are
quite often captured by pre-existing weakly bonded van der Waals (vdW) complexes
[4, 5]. This was the case in our previous study [6– 9] on electron capture in
mixtures containing halomethanes, compounds that are very important from the
environmental point of view. We have found out that, in spite of usually rather slow
processes involving individual molecules, there is a very fast electron attachment by
The purpose of this work was to investigate thermal electron attachment processes
in the next group of halogens containing organic compounds, namely haloethanes.
A modi ed experimental set-up used in the present investigation is shown in Fig. 1.
It consists of an ionization chamber (1) with two parallel electrodes (a) and (b),
To whom correspondence should be addressed.