Electrochemical Etching of a Niobium Film through a Thin Nanomask Formed by AFM Tip-Induced Local Oxidation

Electrochemical Etching of a Niobium Film through a Thin Nanomask Formed by AFM Tip-Induced Local... The anodic-dissolution etching of niobium through a thin anodic-oxide mask is studied experimentally. The electrolyte is an aqueous buffer solution of ammonium fluoride. It is established that the etch rate of niobium is higher than that of the oxide by a few orders of magnitude if the surface potential is 1–1.5 V. It is shown that etching under the stated conditions with a mask formed by AFM tip-induced local oxidation enables one to make nanostructures from niobium epitaxial films of thickness up to over 50 nm. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Electrochemical Etching of a Niobium Film through a Thin Nanomask Formed by AFM Tip-Induced Local Oxidation

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2003 by MAIK Nauka/Interperiodica
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1022647901139
Publisher site
See Article on Publisher Site

Abstract

The anodic-dissolution etching of niobium through a thin anodic-oxide mask is studied experimentally. The electrolyte is an aqueous buffer solution of ammonium fluoride. It is established that the etch rate of niobium is higher than that of the oxide by a few orders of magnitude if the surface potential is 1–1.5 V. It is shown that etching under the stated conditions with a mask formed by AFM tip-induced local oxidation enables one to make nanostructures from niobium epitaxial films of thickness up to over 50 nm.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 11, 2004

References

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