Diffusion of Nitrogen Atoms Implanted into Synthetic Diamonds

Diffusion of Nitrogen Atoms Implanted into Synthetic Diamonds The effect of isothermal annealing on the depth profiles of nitrogen atoms implanted into synthetic diamonds is studied by secondary-ion mass spectrometry. The annealing is performed under vacuum at 1400°C for 1, 5, or 20 h. It is found that the depth profile broadens on a macroscopic scale with annealing time. The broadening is successfully represented by a mathematical model of diffusion. The diffusion coefficient is roughly estimated at 2.3 × 10–15, 8.5 × 10–16, and 3.7 × 10–16 cm2/s for annealing times of 1, 5, and 20 h, respectively. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Diffusion of Nitrogen Atoms Implanted into Synthetic Diamonds

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Publisher
Kluwer Academic Publishers-Plenum Publishers
Copyright
Copyright © 2002 by MAIK "Nauka/Interperiodica"
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1023/A:1020230823633
Publisher site
See Article on Publisher Site

Abstract

The effect of isothermal annealing on the depth profiles of nitrogen atoms implanted into synthetic diamonds is studied by secondary-ion mass spectrometry. The annealing is performed under vacuum at 1400°C for 1, 5, or 20 h. It is found that the depth profile broadens on a macroscopic scale with annealing time. The broadening is successfully represented by a mathematical model of diffusion. The diffusion coefficient is roughly estimated at 2.3 × 10–15, 8.5 × 10–16, and 3.7 × 10–16 cm2/s for annealing times of 1, 5, and 20 h, respectively.

Journal

Russian MicroelectronicsSpringer Journals

Published: Oct 13, 2004

References

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