Matching one-dimensional photonic bandgap theory with the grating condition, a novel design approach of the etched diffraction grating for the demultiplexer was proposed. With a stack of eight alternating dielectric layers per grating tooth, a computed reflection efficiency of 98% around the central wavelength was achieved by this method. The grating efficiency approached −0.78 dB with a channel uniformity of 0.06 dB over 120 nm bandwidth, and the neighbor channel crosstalk was better than −20 dB. An analysis of etching deviation suggests that the diffraction grating designed by this approach is very tolerant concerning fabrication imperfections.
Optical and Quantum Electronics – Springer Journals
Published: Jul 12, 2017
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