Depth profiles of refractive index in thermally grown and LPCVD oxide films on silicon

Depth profiles of refractive index in thermally grown and LPCVD oxide films on silicon Thin and thick silicon oxide films are grown by thermal oxidation of silicon in dry oxygen or by LPCVD from a mixture of monosilane with oxygen or nitrous oxide. Depth profiles of refractive index are determined in these films by monochromatic ellipsometry, with the measurements interpreted by solving an inverse problem within a multilayer model. The differences between the depth profiles are found to be consistent with well-known mechanisms of film growth under the process conditions applied. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Depth profiles of refractive index in thermally grown and LPCVD oxide films on silicon

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2008 by MAIK Nauka
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739708030013
Publisher site
See Article on Publisher Site

Abstract

Thin and thick silicon oxide films are grown by thermal oxidation of silicon in dry oxygen or by LPCVD from a mixture of monosilane with oxygen or nitrous oxide. Depth profiles of refractive index are determined in these films by monochromatic ellipsometry, with the measurements interpreted by solving an inverse problem within a multilayer model. The differences between the depth profiles are found to be consistent with well-known mechanisms of film growth under the process conditions applied.

Journal

Russian MicroelectronicsSpringer Journals

Published: May 27, 2008

References

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