ISSN 1070-4272. Russian Journal of Applied Chemistry, 2006, Vol. 79, No. 1, pp. 152!155. + Pleiades Publishing, Inc., 2006.
Original Russian Text + V.S. Abramov, V.V. Marusin, 2006, published in Zhurnal Prikladnoi Khimii, 2006, Vol. 79, No. 1, pp. 154 !156.
Deposition of Polysiloxane Films in a Glow Discharge
V. S. Abramov and V. V. Marusin
Institute of Theoretical and Applied Mechanics, Siberian Division, Russian Academy of Sciences,
Received January 26, 2005; in final form, November 15, 2005
Abstract-The method of polymerization in the plasma of a dc glow discharge was used to obtain thin-film
polysiloxane coatings on metallic substrates. The chemical composition, structure, and deposition rate of
the coatings were studied in relation to process parameters.
This study is concerned with deposition of thin
organosilicon coatings on metallic substrates by poly-
merization in the plasma of a glow discharge in a
vacuum. Coatings of this kind can be used as antifric-
tion, dielectric, protective, and hydrophobic films. Use
of plasma polymerization minimizes the expenditure
of materials and makes it possible to obtain thin coat-
ings with a thickness of fractions of a micrometer
. To solve the problem, a deposition installation
and a procedure for measuring the thickness of the
coatings obtained were developed. The composition
and structure of the coatings were determined by
reflection IR spectroscopy.
The installation developed in the study is shown
schematically in Fig. 1.
The installation includes as a basic unit the work-
ing chamber fabricated in the form of a 500 0 300 mm
12Cr18Ni10Ti stainless steel cylinder. The cowling
of the chamber has three windows for visual inspec-
tion of the process and a hatch with an inner diameter
of 250 mm. The lids of the working chamber have
apertures for voltage supply to the working electrodes.
The 10-mm-thick electrodes are fabricated from D16T
aluminum alloy. Systems of parallel electrodes of
diameters D 90 and 45 mm are used. An annular hol-
low, made within the upper electrode, is closed with
a tightly fit Teflon cover. The hollow is connected
with the lower surface of the electrode by a number of
fine (D = 0.8 mm) apertures. The Teflon cover has
a pipe for delivery of the monomer vapor into the
hollow. This design provides uniform distribution
of the monomer vapor over the entire interelectrode
The pressure in the working chamber was moni-
tored with a VT-3 thermocouple vacuum gage. The
discharge was electrically fed from a UIP-1 versatile
power source with a ballast resistor of 6.9 kW. The
vessel with the starting monomer was connected with
the working chamber via a leak. The vessel was heated
with an electric heater. The chamber had a special
inlet for a wire probe for measuring by the Klagge
method the discharge parameters and the thickness
of a film being deposited .
The 132-24 oligodiethylsiloxane liquid was used as
the monomer. Its functional composition was the fol-
)SiO, and C
Fig. 1. Schematic of the installation: (1) working chamber,
(2) vacuum pump, (3) mechanical vacuum gage, (4) ther-
mocouple tube, (5) thermocouple vacuum gage, (6) evacua-
tion valve, (7) upper electrode, (8) lower electrode, (9) leak,
(10) vessel with the monomer, (11) electric heater,
(12) laboratory autotransformer, (13) milliammeter,
(14) ballast resistor, and (15) power source.