Creation of lithographic masks using a scanning probe microscope

Creation of lithographic masks using a scanning probe microscope The experimental results on scanning probe lithography (SPL)—the formation of lithographic masks using scanning probe microscope—are presented. Polymethylmethacrylate (PMMA)-based masks prepared by the SPL method are used to form metal nanoparticles of the specified sizes and shape, as well as the metallic nanowires connecting the contact areas. The analysis of various SPL modes showed that the procedure of point indentation with the switched-on microscope feedback is optimal for the formation of round nanoparticles. When forming the rectangular particles, the procedure of multiple scanning of one region in the contact mode is optimal. The quality of lithographic masks can be substantially increased by the additional use of chemical etching to remove excess PMMA after the mask is formed. The topography and magnetization structure of the formed structures were monitored by atomic force microscopy and magnetic force microscopy. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Creation of lithographic masks using a scanning probe microscope

Loading next page...
 
/lp/springer_journal/creation-of-lithographic-masks-using-a-scanning-probe-microscope-115rimpLXx
Publisher
Pleiades Publishing
Copyright
Copyright © 2015 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739715050042
Publisher site
See Article on Publisher Site

Abstract

The experimental results on scanning probe lithography (SPL)—the formation of lithographic masks using scanning probe microscope—are presented. Polymethylmethacrylate (PMMA)-based masks prepared by the SPL method are used to form metal nanoparticles of the specified sizes and shape, as well as the metallic nanowires connecting the contact areas. The analysis of various SPL modes showed that the procedure of point indentation with the switched-on microscope feedback is optimal for the formation of round nanoparticles. When forming the rectangular particles, the procedure of multiple scanning of one region in the contact mode is optimal. The quality of lithographic masks can be substantially increased by the additional use of chemical etching to remove excess PMMA after the mask is formed. The topography and magnetization structure of the formed structures were monitored by atomic force microscopy and magnetic force microscopy.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 4, 2015

References

You’re reading a free preview. Subscribe to read the entire article.


DeepDyve is your
personal research library

It’s your single place to instantly
discover and read the research
that matters to you.

Enjoy affordable access to
over 12 million articles from more than
10,000 peer-reviewed journals.

All for just $49/month

Explore the DeepDyve Library

Unlimited reading

Read as many articles as you need. Full articles with original layout, charts and figures. Read online, from anywhere.

Stay up to date

Keep up with your field with Personalized Recommendations and Follow Journals to get automatic updates.

Organize your research

It’s easy to organize your research with our built-in tools.

Your journals are on DeepDyve

Read from thousands of the leading scholarly journals from SpringerNature, Elsevier, Wiley-Blackwell, Oxford University Press and more.

All the latest content is available, no embargo periods.

See the journals in your area

Monthly Plan

  • Read unlimited articles
  • Personalized recommendations
  • No expiration
  • Print 20 pages per month
  • 20% off on PDF purchases
  • Organize your research
  • Get updates on your journals and topic searches

$49/month

Start Free Trial

14-day Free Trial

Best Deal — 39% off

Annual Plan

  • All the features of the Professional Plan, but for 39% off!
  • Billed annually
  • No expiration
  • For the normal price of 10 articles elsewhere, you get one full year of unlimited access to articles.

$588

$360/year

billed annually
Start Free Trial

14-day Free Trial