ISSN 1070-4272, Russian Journal of Applied Chemistry, 2014, Vol. 87, No. 10, pp. 1566−1569. © Pleiades Publishing, Ltd., 2014.
Original Russian Text © K.G. Guliev, A.M. Alieva, G.Z. Ponomareva, A.M. Guliev, 2014, published in Zhurnal Prikladnoi Khimii, 2014, Vol. 87, No. 10, pp. 1521−1525.
AND POLYMERIC MATERIALS
Copolymerization of (p-Vinylphenyl)cyclopropylmethyl
Cinnamate with Styrene
K. G. Guliev, A. M. Alieva, G. Z. Ponomareva, and A. M. Guliev
Institute of Polymeric Materials, National Academy of Sciences of Azerbaijan,
ul. Vurguna 124, Sumgait, AZ5004 Azerbaijan
Received May 13, 2014
Abstract—Radical copolymerization of (p-vinylphenyl)cyclopropylmethyl cinnamate with styrene was studied.
A new cyclopropane-containing photosensitive copolymer was prepared. The composition and structure of the
synthesized copolymer and the relative activity constants of the monomers were determined, and the Q–e pa-
rameters were calculated. The dependence of the photosensitivity on the copolymer composition was revealed.
Negative photoresists based on polyvinyl cinnamate
and cyclorubber were among the ﬁ rst polymeric materials
tested as electron resists . The available synthetic
polymers considered as photo- and electron resists for
microelectronics meet the requirements imposed upon
materials for these purposes (high photosensitivity,
satisfactory resolving power, resistance to chemical
actions, high adhesion of the photoresist ﬁ lm to the
support, good deformation and strength characteristics)
to insufﬁ cient extent.
This fact accounts for strong researchers’ interest in
preparation of new types of photosensitive materials
for use in microelectronics [2–8]. The route to the new
materials is synthesis and polymerization of functionally
substituted cyclopropylstyrenes [9–12].
Interest in such polymers is caused by the fact that
the forming macromolecules contain reactive functional
groups of various kinds in pendant chains. Polymerization
of functionally substituted cyclopropane-containing
vinyl monomers yielded polymers with cyclopropane-
containing pendant chains [13, 14].
In this work, we studied the copolymerization of
(p-vinylphenyl)cyclopropylmethyl cinnamate (PCPC)
with styrene and examined the structure and properties
of the resulting copolymer with the aim of developing
new photosensitive polymers. It can be anticipated that
the presence of the cyclopropane ring and its conjugation
with the phenyl core, and also the presence of the strongly
absorbing carbonyl group in the monomer molecule will
inﬂ uence such important characteristics of the resist as
the photosensitivity, resolving power, adhesion, ﬁ lm
PCPC is a new reactive monomer. Data on its
synthesis and homopolymerization are given in . For
copolymerization of the systems under consideration,
it was important to ﬁ nd the conditions at which the
polymerization would occur only via the vinyl group, with
the reactive fragments remaining intact in the pendant
chain. Therefore, the copolymerization was performed
in the presence of a radical initiator, AIBN.
PCPC was synthesized by the procedure described
Copolymerization of the synthesized PCPC monomer
with styrene was performed in ampules in a benzene
solution in the presence of 0.5% azobis(isobutyronitrile)