Atomic mechanisms of strain relaxation in heteroepitaxial Cu/Ni(001) system

Atomic mechanisms of strain relaxation in heteroepitaxial Cu/Ni(001) system Strain relief mechanisms in heteroepitaxial Cu/Ni(001) system are studied using molecular static methods with semiempirical EAM potentials. In particular, the process of a V-shape defect (internal (111) faceting) nucleation is considered, and the corresponding activation barriers and critical thicknesses are estimated. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Atomic mechanisms of strain relaxation in heteroepitaxial Cu/Ni(001) system

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Publisher
Pleiades Publishing
Copyright
Copyright © 2015 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739715060086
Publisher site
See Article on Publisher Site

Abstract

Strain relief mechanisms in heteroepitaxial Cu/Ni(001) system are studied using molecular static methods with semiempirical EAM potentials. In particular, the process of a V-shape defect (internal (111) faceting) nucleation is considered, and the corresponding activation barriers and critical thicknesses are estimated.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 4, 2015

References

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