Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water

Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water The atomic layer deposition of titanium oxide in the precursor systems Ti(OCH3)4-H2O and Ti(OC2H5)4-H2O was compared. The growth rate of titanium oxide formed by the atomic layer deposition in the Ti(OCH3)4-H2O system can be adequately estimated with due to regard for the number and size of ligands of a metal-containing precursor. The study in simulated body fluid solutions showed that polycrystallin TiO2 coatings with anatase structure are prone to accelerated osseointegration and, consequently, promising for the development of new biomedical products. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Journal of Applied Chemistry Springer Journals

Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water

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Publisher
SP MAIK Nauka/Interperiodica
Copyright
Copyright © 2013 by Pleiades Publishing, Ltd.
Subject
Chemistry; Chemistry/Food Science, general; Industrial Chemistry/Chemical Engineering
ISSN
1070-4272
eISSN
1608-3296
D.O.I.
10.1134/S1070427213030063
Publisher site
See Article on Publisher Site

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