The three-step fabrication of microscopic pillar arrays by the anodic oxidation of Al/Ta thin-film structures on dielectric or silicon substrates is studied experimentally. The major features of pillar-growth kinetics are described. The main properties of the arrays are evaluated by scanning electron microscopy and simultaneous current–voltage tracing. The ranges of variation for geometric array parameters are determined. The pillars grown have a maximum height-to-diameter ratio of 17.0, a maximum height of 540 nm, and a minimum radius of about 15 nm. The maximum density of pillars in an array is 8.25 × 1010cm–2. A good reproducibility of physical and morphological properties is achieved for large-area pillar arrays. Potential applications of pillar arrays are recited: light-emitting diodes, thin-film controllers, solar batteries, spatial light modulators, polarizers, etc. It is noted that an investigation into the fabrication of pillar arrays for field-emitter displays is currently in progress.
Russian Microelectronics – Springer Journals
Published: Oct 10, 2004
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