Absolute diode laser-based in situ detection of HCl in gasification processes

Absolute diode laser-based in situ detection of HCl in gasification processes The release of HCl is an important parameter for industrial combustion and gasification processes, which must be determined in the ppm range for active process control and optimization. Based on a low power vertical-cavity surface-emitting laser (VCSEL) at 1.74 μm, we developed a new tuneable diode laser absorption spectrometer for calibration-free, absolute in situ HCl detection using the H35Cl (2 ← 0) R(3) absorption line with minimized cross-sensitivity to CO2 and H2O. The spectrometer was applied to in situ measurements in a gasification process (T = 1,130°C, P = 1 atm, L = 28 cm) and yielded an optical resolution of 2.3·10−4, i.e. a HCl sensitivity of 45 ppm (13 ppm·m). http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Experiments in Fluids Springer Journals

Absolute diode laser-based in situ detection of HCl in gasification processes

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Publisher
Springer-Verlag
Copyright
Copyright © 2010 by Springer-Verlag
Subject
Engineering; Engineering Thermodynamics, Heat and Mass Transfer; Fluid- and Aerodynamics; Engineering Fluid Dynamics
ISSN
0723-4864
eISSN
1432-1114
D.O.I.
10.1007/s00348-010-0904-2
Publisher site
See Article on Publisher Site

Abstract

The release of HCl is an important parameter for industrial combustion and gasification processes, which must be determined in the ppm range for active process control and optimization. Based on a low power vertical-cavity surface-emitting laser (VCSEL) at 1.74 μm, we developed a new tuneable diode laser absorption spectrometer for calibration-free, absolute in situ HCl detection using the H35Cl (2 ← 0) R(3) absorption line with minimized cross-sensitivity to CO2 and H2O. The spectrometer was applied to in situ measurements in a gasification process (T = 1,130°C, P = 1 atm, L = 28 cm) and yielded an optical resolution of 2.3·10−4, i.e. a HCl sensitivity of 45 ppm (13 ppm·m).

Journal

Experiments in FluidsSpringer Journals

Published: Jun 10, 2010

References

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