A nanodimensional silicon fabricated using HCl: HF: C2H5OH electrolyte

A nanodimensional silicon fabricated using HCl: HF: C2H5OH electrolyte The results of studies of nanodimensional silicon (NS) samples, which do not degrade under the intense laser radiation exposure, are presented. It was shown that a significant increase in the intensity of the photoluminescence signal from the NS can be attributed to both the special features of their structural configuration and the available thin SiO2 layer on the surface of the nanocrystals. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

A nanodimensional silicon fabricated using HCl: HF: C2H5OH electrolyte

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Publisher
Springer US
Copyright
Copyright © 2013 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S106373971308012X
Publisher site
See Article on Publisher Site

Abstract

The results of studies of nanodimensional silicon (NS) samples, which do not degrade under the intense laser radiation exposure, are presented. It was shown that a significant increase in the intensity of the photoluminescence signal from the NS can be attributed to both the special features of their structural configuration and the available thin SiO2 layer on the surface of the nanocrystals.

Journal

Russian MicroelectronicsSpringer Journals

Published: Nov 14, 2013

References

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