A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow nanospheres

A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow... Electronic supplementary material The online version of this article (https://doi.org/10.1007/s10971-018-4705-z) contains supplementary material, which is available to authorized users. * Lianxi Chen School of Materials Science and Engineering, Wuhan University clx@whut.edu.cn of Technology, Wuhan 430070, P. R. China Food science and engineering college, Wuchang Institute of School of Chemistry, Chemical Engineer and Life Science, Wuhan Technology, Wuhan 430065, P. R. China University of Technology, Wuhan 430070, P. R. China 1234567890();,: 1234567890();,: Journal of Sol-Gel Science and Technology Highlights Organic hollow silica nanoshperes (OHSNs) can be fabricated without post-modification. High-temperature and time-consuming treatment, corrosive etchant were not involved. The strategy might be further extended to fabricate OHNSs with other worthy groups. ● ● ● Key words Hollow structure Organosilica Selective etching Surfactant 1 Introduction potential value of CTAB in fabricating hollow structure remains to be further explored. Organosilica hollow nanospheres (OHNSs) have increas- In our previous work, a “functional group difference- ingly held researchers’ attention for their great potential based selective etching”strategy had been developed to application in many fields, such as drug delivery, catalysis, prepare OHNSs from bifunctional organic core/shell nano- adsorbing materials and nanoreactors [1–6], on account of spheres via a two-step sol-gel reaction in one pot [30, http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Sol-Gel Science and Technology Springer Journals

A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow nanospheres

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Publisher
Springer US
Copyright
Copyright © 2018 by Springer Science+Business Media, LLC, part of Springer Nature
Subject
Materials Science; Ceramics, Glass, Composites, Natural Materials; Inorganic Chemistry; Optical and Electronic Materials; Nanotechnology
ISSN
0928-0707
eISSN
1573-4846
D.O.I.
10.1007/s10971-018-4705-z
Publisher site
See Article on Publisher Site

Abstract

Electronic supplementary material The online version of this article (https://doi.org/10.1007/s10971-018-4705-z) contains supplementary material, which is available to authorized users. * Lianxi Chen School of Materials Science and Engineering, Wuhan University clx@whut.edu.cn of Technology, Wuhan 430070, P. R. China Food science and engineering college, Wuchang Institute of School of Chemistry, Chemical Engineer and Life Science, Wuhan Technology, Wuhan 430065, P. R. China University of Technology, Wuhan 430070, P. R. China 1234567890();,: 1234567890();,: Journal of Sol-Gel Science and Technology Highlights Organic hollow silica nanoshperes (OHSNs) can be fabricated without post-modification. High-temperature and time-consuming treatment, corrosive etchant were not involved. The strategy might be further extended to fabricate OHNSs with other worthy groups. ● ● ● Key words Hollow structure Organosilica Selective etching Surfactant 1 Introduction potential value of CTAB in fabricating hollow structure remains to be further explored. Organosilica hollow nanospheres (OHNSs) have increas- In our previous work, a “functional group difference- ingly held researchers’ attention for their great potential based selective etching”strategy had been developed to application in many fields, such as drug delivery, catalysis, prepare OHNSs from bifunctional organic core/shell nano- adsorbing materials and nanoreactors [1–6], on account of spheres via a two-step sol-gel reaction in one pot [30,

Journal

Journal of Sol-Gel Science and TechnologySpringer Journals

Published: Jun 4, 2018

References

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