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Stress relaxation-induced phase transformation in chromium nitride films



J O U R N A L O F M A T E R I A L S S C I E N C E L E T T E R S 2 2, 2 0 0 3, 817 – 819 Stress relaxation-induced phase transformation in chromium nitride films HONG-YING CHEN, FU-HSING LU∗ Department of Materials Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, Republic of China E-mail: fhlu@dragon.nchu.edu.tw Chromium nitride (CrN) films have been widely used as tribological coatings and also in the electronics industry, because of their high hardness (Hv 1090) and low resistivity (640 µ -cm) [1]. Although the oxidation of CrN films has been investigated extensively, the phase transformation of CrN to Cr2 N has seldom been studied [2–6]. Lai and Wu [2] stated that the Cr2 N phase was generated in CrN films annealed at 1150 ◦ C in N2 and vacuum (pO2 = 1.3 × 10−3 Pa) conditions. H´ au e et al. [3] indicated that Cr2 N was present in CrN films annealed above 327 ◦ C in vacuum (pO2 = 10−3 Pa). Almer et al. [4] reported that CrN transformed to Cr2 N between 450 ◦



Journal of Materials ScienceSpringer Journals

Published: Jun 1, 2003

DOI: 10.1023/A:1023912225718

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