Laser imitation simulation behind the diffraction limit

Laser imitation simulation behind the diffraction limit Results of the review of numerous investigations in the field of modern nanooptics, which show that there are various penetration mechanisms of laser radiation energy inside subwave apertures, are presented. They also show that the methods of laser imitation simulation of bulk ionization effects can be used up to nanometer levels of microcircuit technology with the obligatory dosimetry calibration. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Russian Microelectronics Springer Journals

Laser imitation simulation behind the diffraction limit

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Publisher
Springer Journals
Copyright
Copyright © 2014 by Pleiades Publishing, Ltd.
Subject
Engineering; Electrical Engineering
ISSN
1063-7397
eISSN
1608-3415
D.O.I.
10.1134/S1063739714020097
Publisher site
See Article on Publisher Site

Abstract

Results of the review of numerous investigations in the field of modern nanooptics, which show that there are various penetration mechanisms of laser radiation energy inside subwave apertures, are presented. They also show that the methods of laser imitation simulation of bulk ionization effects can be used up to nanometer levels of microcircuit technology with the obligatory dosimetry calibration.

Journal

Russian MicroelectronicsSpringer Journals

Published: Mar 26, 2014

References

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