Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

Abderrahim Ait hssi; Elhassan Amaterz; Nabil labchir; Ahmed Soussi; Abdeslam Elfanaoui; Abdeljalil Benlhachemi; Ahmed Ihlal; Khalid Bouabid

doi:10.1007/s10854-022-08481-6

Ait hssi, Abderrahim; Amaterz, Elhassan; labchir, Nabil; Soussi, Ahmed; Elfanaoui, Abdeslam; Benlhachemi, Abdeljalil; Ihlal, Ahmed; Bouabid, Khalid

2022-07-01 00:00:00

Nanostructured Cu2O films have been developed on various conductive substrates (FTO, ITO, and Mo) by a low-cost electrodeposition process and used as catalysts for the electrochemical and photoelectrochemical of Rhodamine B (RhB). The effect of the conductive substrate on the crystalline structure, surface morphology, and photoelectrochemical properties of synthesized Cu2O layers was studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV–Vis transmittance, and photocurrent spectroscopy. XRD confirmed that on all three substrates, a single-phase is formed, crystallizing in a cubic structure with a (111) plane orientation, demonstrating good crystal quality. SEM images indicated that the deposits were homogeneous, dense, and uniform with a morphology grain with three and four facets pyramid-shaped. Smaller grain sizes and the largest surface area on the molybdenum substrate were observed. The optical band gap of Cu2O elaborated is between 2.26 and 2.20 eV. The films exhibit p-type characteristics with carrier densities ranging from 2 × 1018 to 3.76 × 1020 cm−3. The Cu2O/Mo showed the highest performance in terms of RhB dye degradation among the other catalysts and the photoelectrochemical degradation of the same dye was faster while combining UV light with current density. Therefore, the results designate that the choice of substrate for deposited Cu2O films is essential.

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Journal of Materials Science:Materials in Electronics Springer Journals

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Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

$Nanostructured Cu2O films have been developed on various conductive substrates (FTO, ITO, and Mo) by a low-cost electrodeposition process and used as catalysts for the electrochemical and photoelectrochemical of Rhodamine B (RhB). The effect of the conductive substrate on the crystalline structure, surface morphology, and photoelectrochemical properties of synthesized Cu2O layers was studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV–Vis transmittance, and photocurrent spectroscopy. XRD confirmed that on all three substrates, a single-phase is formed, crystallizing in a cubic structure with a (111) plane orientation, demonstrating good crystal quality. SEM images indicated that the deposits were homogeneous, dense, and uniform with a morphology grain with three and four facets pyramid-shaped. Smaller grain sizes and the largest surface area on the molybdenum substrate were observed. The optical band gap of Cu2O elaborated is between 2.26 and 2.20 eV. The films exhibit p-type characteristics with carrier densities ranging from 2 × 1018 to 3.76 × 1020 cm−3. The Cu2O/Mo showed the highest performance in terms of RhB dye degradation among the other catalysts and the photoelectrochemical degradation of the same dye was faster while combining UV light with current density. Therefore, the results designate that the choice of substrate for deposited Cu2O films is essential.$

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Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

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Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

Electrodeposition of nanostructured cuprous oxide on various substrates and their electrochemical and photoelectrochemical properties

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