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- Publisher
- SPIE
- Copyright
- Copyright © 2006 Society of Photo-Optical Instrumentation Engineers
- ISSN
- 1932-5150
- eISSN
- 1932-5134
- DOI
- 10.1117/1.2176730
- Publisher site
- See Article on Publisher Site
Abstract
We introduce simple double-casting replication methods for high-aspect-ratio microstructures fabricated by deep x-ray lithography using intermediate molds of soft materials. Two types of soft material are investigated. The ability to fabricate polymethylsiloxane (PDMS) molds with well-type structures with aspect ratios up to 35:1 is demonstrated for structure densities below 50&percent;, and the reproduction from this mold of pillar-type polymethyl methacrylate (PMMA) structures with aspect ratios of 20:1 is achieved. Polyvinyl alcohol (PVA), a water soluble polymer, is also tested as a sacrificial intermediate mold and successfully used for the replication of structures with aspect ratios up to 5:1. Double-casting replication methods are described and discussed for their potential improvement.
Journal
Journal of Micro/Nanolithography, MEMS and MOEMS – SPIE
Published: Jan 1, 2006
Keywords: deep x-ray lithography; double casting; high aspect ratio; polydimethylsiloxane; polyvinyl alcohol