This paper describes diffraction-pattern sampling as a basis for automatic pattern recognition in photographic imagery; it covers: diffraction-pattern generation, diffraction-pattern/image-area relationships, diffraction-pattern sampling, algorithm development, facility description, and experimental results which have been obtained over the last few years at General Motors' AC Electronics-Defense Research Laboratories in Santa Barbara, California. Sampling the diffraction pattern results in a sample - signature - a different one for each sampling geometry. The kinds of information obtainable from sample-signatures are described, and considerations for developing algorithms based on such information are discussed. A tutorial section is included for the purpose of giving the reader an intuitive feeling for the kinds of information contained in a diffraction pattern and how it relates to the original photographic imagery.
Proceedings of SPIE – SPIE
Published: Dec 9, 1969
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