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Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and... In this paper, SU-8 EPON-based photoresist (PR) polymerizationoptimization and its possible microfluidic and MEMS applications arereported. First, the optimization results of SU-8 under UV lithography arereported. The parameters which could have an influence on the lithographyquality were chosen and optimized by a three-level, L9 orthogonal array ofthe Taguchi method. By optimization, the optimal parameter range and theweighted per cent of a parameter on the final results were determined. ForSU-8-5 and SU-8-50, many microstructures with thicknesses of more than 100and 500 µm and aspect ratios of more than 20 and 50 were obtained withhigh resolution. The optimization results show that the prebake time playsthe key role in the quality, which is different from the previouslypublished results. With the optimization results obtained, some possibleapplications of SU-8 were developed and demonstrated. These applicationsincluded using SU-8 as a structural material for a microfluidic system, as amicromold for electroplating, as a master for plastic hot-embossing, and evenas a mask for some wet-etching processes. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Micromechanics and Microengineering IOP Publishing

Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

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References (15)

Copyright
Copyright © IOP Publishing Ltd
ISSN
0960-1317
eISSN
1361-6439
DOI
10.1088/0960-1317/11/1/304
Publisher site
See Article on Publisher Site

Abstract

In this paper, SU-8 EPON-based photoresist (PR) polymerizationoptimization and its possible microfluidic and MEMS applications arereported. First, the optimization results of SU-8 under UV lithography arereported. The parameters which could have an influence on the lithographyquality were chosen and optimized by a three-level, L9 orthogonal array ofthe Taguchi method. By optimization, the optimal parameter range and theweighted per cent of a parameter on the final results were determined. ForSU-8-5 and SU-8-50, many microstructures with thicknesses of more than 100and 500 µm and aspect ratios of more than 20 and 50 were obtained withhigh resolution. The optimization results show that the prebake time playsthe key role in the quality, which is different from the previouslypublished results. With the optimization results obtained, some possibleapplications of SU-8 were developed and demonstrated. These applicationsincluded using SU-8 as a structural material for a microfluidic system, as amicromold for electroplating, as a master for plastic hot-embossing, and evenas a mask for some wet-etching processes.

Journal

Journal of Micromechanics and MicroengineeringIOP Publishing

Published: Jan 1, 2001

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