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Thickfilm Fineline Fabrication Techniques Application to Front Metallisation of Solar Cells

Thickfilm Fineline Fabrication Techniques Application to Front Metallisation of Solar Cells Different techniques applied for the fabrication of thickfilm fine lines have been analysed. The basics, achievements, advantages and disadvantages of improved screen printing, screen printing with metal masks, the direct writing method, offset printing and photoformed or photoetched thickfilm are presented. In addition, current trends in front metallisation of silicon solar cells are described. Based on a critical review, the use of thickfilm fine lines for this purpose is discussed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Microelectronics International Emerald Publishing

Thickfilm Fineline Fabrication Techniques Application to Front Metallisation of Solar Cells

Dziedzic, A.; Nijs, J.; Szlufcik, J.
Microelectronics International , Volume 10 (1): 9 – Jan 1, 1993
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Publisher
Emerald Publishing
Copyright
Copyright © Emerald Group Publishing Limited
ISSN
1356-5362
DOI
10.1108/eb044486
Publisher site
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Abstract

Different techniques applied for the fabrication of thickfilm fine lines have been analysed. The basics, achievements, advantages and disadvantages of improved screen printing, screen printing with metal masks, the direct writing method, offset printing and photoformed or photoetched thickfilm are presented. In addition, current trends in front metallisation of silicon solar cells are described. Based on a critical review, the use of thickfilm fine lines for this purpose is discussed.

Journal

Microelectronics International – Emerald Publishing

Published: Jan 1, 1993

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