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Selection of Optimal Meshes for the Solution of Nonlinear Dopant Diffusion Problems

Selection of Optimal Meshes for the Solution of Nonlinear Dopant Diffusion Problems In this paper we investigate the optimal choice of rectangular meshes for the solution of nonlinear dopant diffusion problems in semiconductor process modelling. Firstly we show some results giving better error monitor functions as criteria for obtaining an adapted mesh. Secondly we survey some 1D methods to implement the error equidistribution law and produce the mesh. Finally we implement the new mesh generation strategies in the finite element simulator ASWR of COMPOSITE and report on the full simulation results. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png COMPEL: Theinternational Journal for Computation and Mathematics in Electrical and Electronic Engineering Emerald Publishing

Selection of Optimal Meshes for the Solution of Nonlinear Dopant Diffusion Problems

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Publisher
Emerald Publishing
Copyright
Copyright © Emerald Group Publishing Limited
ISSN
0332-1649
DOI
10.1108/eb010104
Publisher site
See Article on Publisher Site

Abstract

In this paper we investigate the optimal choice of rectangular meshes for the solution of nonlinear dopant diffusion problems in semiconductor process modelling. Firstly we show some results giving better error monitor functions as criteria for obtaining an adapted mesh. Secondly we survey some 1D methods to implement the error equidistribution law and produce the mesh. Finally we implement the new mesh generation strategies in the finite element simulator ASWR of COMPOSITE and report on the full simulation results.

Journal

COMPEL: Theinternational Journal for Computation and Mathematics in Electrical and Electronic EngineeringEmerald Publishing

Published: Apr 1, 1992

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