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BULK IMAGE EFFECTS OF PHOTORESIST IN THREEDIMENSIONAL PROFILE SIMULATION

BULK IMAGE EFFECTS OF PHOTORESIST IN THREEDIMENSIONAL PROFILE SIMULATION 3D bulk image effects in highNA lens lithography are studied through 3D exposure and development simulations by applying a Mack model to the 3D exposure process. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png COMPEL: Theinternational Journal for Computation and Mathematics in Electrical and Electronic Engineering Emerald Publishing

BULK IMAGE EFFECTS OF PHOTORESIST IN THREEDIMENSIONAL PROFILE SIMULATION

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Publisher
Emerald Publishing
Copyright
Copyright © Emerald Group Publishing Limited
ISSN
0332-1649
DOI
10.1108/eb051715
Publisher site
See Article on Publisher Site

Abstract

3D bulk image effects in highNA lens lithography are studied through 3D exposure and development simulations by applying a Mack model to the 3D exposure process.

Journal

COMPEL: Theinternational Journal for Computation and Mathematics in Electrical and Electronic Engineering – Emerald Publishing

Published: Apr 1, 1991

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