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References (8)
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- Publisher
- Emerald Publishing
- Copyright
- Copyright © Emerald Group Publishing Limited
- ISSN
- 0332-1649
- DOI
- 10.1108/eb051715
- Publisher site
- See Article on Publisher Site
Abstract
3D bulk image effects in highNA lens lithography are studied through 3D exposure and development simulations by applying a Mack model to the 3D exposure process.
Journal
COMPEL: The International Journal for Computation and Mathematics in Electrical and Electronic Engineering – Emerald Publishing
Published: Apr 1, 1991