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Borosilicate spray-on glass solutions for fabrication silicon solar cell back surface field

Borosilicate spray-on glass solutions for fabrication silicon solar cell back surface field PurposeThe purpose of this paper is to develop a method of preparing spray-on dopant solutions that enable obtaining a p+ region forming a back-surface field (BSF) during the diffusion doping process. The spray-on method used allows to decrease the costs of dopant solution application, which is particularly significant for new low-cost production processes.Design/methodology/approachThis paper presents steps of production of high concentration boron dopant solutions enabling diffusion doping of crystalline p-type silicon surfaces. To check the fabricated dopant solutions for stability and suitability for spray-on application, their viscosity and density were measured in week-long intervals. The dopant solutions described in this paper were used in a series of diffusion doping processes to confirm their suitability for BSF production.FindingsA method of preparing dopant solutions with parameters enabling depositing them on silicon wafers by the spray-on method has been established. Due to hygroscopic properties of the researched dopant solutions, a maximum surrounding atmosphere humidity has been established. The solutions should not be applied by the spray-on method, if this humidity value is exceeded. The conducted derivatographic examination enabled establishing optimal drying conditions.Originality/valueThe paper presents a new composition of a dopant solution which contains high concentration of boron and may be applied by the spray-on method. Derivatographic examination results, as well as equations describing the relation between dopant solution density and viscosity and storage time are also original for this research. The established dependencies between the sheet resistance of the fabricated BSF and the diffusion doping time are other new elements described in the paper. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Microelectronics International Emerald Publishing

Borosilicate spray-on glass solutions for fabrication silicon solar cell back surface field

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Publisher
Emerald Publishing
Copyright
Copyright © Emerald Group Publishing Limited
ISSN
1356-5362
DOI
10.1108/MI-12-2017-0075
Publisher site
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Abstract

PurposeThe purpose of this paper is to develop a method of preparing spray-on dopant solutions that enable obtaining a p+ region forming a back-surface field (BSF) during the diffusion doping process. The spray-on method used allows to decrease the costs of dopant solution application, which is particularly significant for new low-cost production processes.Design/methodology/approachThis paper presents steps of production of high concentration boron dopant solutions enabling diffusion doping of crystalline p-type silicon surfaces. To check the fabricated dopant solutions for stability and suitability for spray-on application, their viscosity and density were measured in week-long intervals. The dopant solutions described in this paper were used in a series of diffusion doping processes to confirm their suitability for BSF production.FindingsA method of preparing dopant solutions with parameters enabling depositing them on silicon wafers by the spray-on method has been established. Due to hygroscopic properties of the researched dopant solutions, a maximum surrounding atmosphere humidity has been established. The solutions should not be applied by the spray-on method, if this humidity value is exceeded. The conducted derivatographic examination enabled establishing optimal drying conditions.Originality/valueThe paper presents a new composition of a dopant solution which contains high concentration of boron and may be applied by the spray-on method. Derivatographic examination results, as well as equations describing the relation between dopant solution density and viscosity and storage time are also original for this research. The established dependencies between the sheet resistance of the fabricated BSF and the diffusion doping time are other new elements described in the paper.

Journal

Microelectronics International – Emerald Publishing

Published: Jul 2, 2018

References

  • Electroluminescence imaging for determining the influence of metallization parameters for solar cell metal contacts
  • Comparison of diffused layer prepared using liquid dopant solutions and pastes for solar cell with screen printed electrodes
  • Determination of the sheet resistance of solar cell emitter layer using effective concentration-independent diffusion coefficient
  • Spray-on glass solution for fabrication silicon solar cell emitter layer
  • The passivated emitter and rear cell (PERC): from conception to mass production
  • Analysis of thin bifacial silicon solar cells with locally diffused and selective back surface field
  • Fabrication of c-Si solar cells using boric acid as a spin-on dopant for back surface field
  • c-Si solar cells formed from spin-on phosphoric acid and boric acid
  • 24,5% Efficiency silicon PERT cells on MCZ substrates and 24,7% efficiency PERL cells on FZ substrates