Wettability and boiling heat transfer study of black silicon surface produced using the plasma immersion ion implantation method

Wettability and boiling heat transfer study of black silicon surface produced using the plasma... •A new plasma immersion ion implantation method was used to produce black silicon.•The contact angle of the BSi surfaces becomes larger than that of silicon.•BSi surfaces enhance the HTC at low heat flux by increasing nucleation sites.•BSi surfaces depress the HTC at high heat flux due to the decline of wettability.•PIII is a promising fabrication method for its large-scale treatment ability. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Applied Thermal Engineering Elsevier

Wettability and boiling heat transfer study of black silicon surface produced using the plasma immersion ion implantation method

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Publisher
Elsevier
Copyright
Copyright © 2016 Elsevier Ltd
ISSN
1359-4311
eISSN
1873-5606
D.O.I.
10.1016/j.applthermaleng.2016.01.051
Publisher site
See Article on Publisher Site

Abstract

•A new plasma immersion ion implantation method was used to produce black silicon.•The contact angle of the BSi surfaces becomes larger than that of silicon.•BSi surfaces enhance the HTC at low heat flux by increasing nucleation sites.•BSi surfaces depress the HTC at high heat flux due to the decline of wettability.•PIII is a promising fabrication method for its large-scale treatment ability.

Journal

Applied Thermal EngineeringElsevier

Published: Apr 25, 2016

References

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