Surface reconstruction: An effective method for the growth of mismatched materials

Surface reconstruction: An effective method for the growth of mismatched materials High quality thin film of GaSb was fabricated with molecular beam epitaxy technique on the reconstructed Si(111) surface. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Applied Surface Science Elsevier

Surface reconstruction: An effective method for the growth of mismatched materials

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Publisher
Elsevier
Copyright
Copyright © 2015 Elsevier B.V.
ISSN
0169-4332
eISSN
1873-5584
D.O.I.
10.1016/j.apsusc.2015.10.198
Publisher site
See Article on Publisher Site

Abstract

High quality thin film of GaSb was fabricated with molecular beam epitaxy technique on the reconstructed Si(111) surface.

Journal

Applied Surface ScienceElsevier

Published: Jan 1, 2016

References

  • The physics and technology of gallium antimonide: an emerging optoelectronic material
    Dutta, P.; Bhat, H.; Kumar, V.
  • Lattice-registered growth of GaSb on Si (211) with molecular beam epitaxy
    Vajargah, S.H.; Ghanad-Tavakoli, S.; Preston, J.; Botton, G.; Kleiman, R.
  • Electrical and interfacial properties of GaAs/GaSb metal-organic vapour phase epitaxy heterostructures
    Parisini, A.; Baldini, M.; Gombia, E.; Frigeri, C.; Jakomin, R.; Tarricone, L.
  • Nonpolar GaN films on high-index silicon: lattice matching by design
    Kutana, A.; Erwin, S.C.
  • Structural evolution and characterization of heteroepitaxial GaSb thin films on Si (111) substrates
    Nguyen, T.; Varhue, W.; Cross, M.; Pino, R.; Adams, E.; Lavoie, M.; Lee, J.

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