Stability of thin film resistors – Prediction and differences base on time-dependent Arrhenius law

Stability of thin film resistors – Prediction and differences base on time-dependent Arrhenius law Thin film resistors are widely used in electronic industry. Analogue technique requires a certain precision from the components and a good prediction of what change can happen during application. This paper presents a method for prediction of resistive value changes due to ageing for any relevant condition in the temperature–time-expanse. The method is based and derived from the Arrhenius’ equation. Three new characteristics for stability prediction and evaluation of thin film resistors are introduced: temperature dependence of drift f(t)R , drift potential ln(Δ R/R ) pot , and temperature of absolute stability T stab . Differences and influencing parameter of material and processes on thin film resistor manufacturing will be discussed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Microelectronics Reliability Elsevier

Stability of thin film resistors – Prediction and differences base on time-dependent Arrhenius law

Microelectronics Reliability, Volume 49 (1) – Jan 1, 2009

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Publisher
Elsevier
Copyright
Copyright © 2008 Elsevier Ltd
ISSN
0026-2714
eISSN
1872-941X
D.O.I.
10.1016/j.microrel.2008.10.013
Publisher site
See Article on Publisher Site

Abstract

Thin film resistors are widely used in electronic industry. Analogue technique requires a certain precision from the components and a good prediction of what change can happen during application. This paper presents a method for prediction of resistive value changes due to ageing for any relevant condition in the temperature–time-expanse. The method is based and derived from the Arrhenius’ equation. Three new characteristics for stability prediction and evaluation of thin film resistors are introduced: temperature dependence of drift f(t)R , drift potential ln(Δ R/R ) pot , and temperature of absolute stability T stab . Differences and influencing parameter of material and processes on thin film resistor manufacturing will be discussed.

Journal

Microelectronics ReliabilityElsevier

Published: Jan 1, 2009

References

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