Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams

Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on... Applied Surface Science 442 (2018) 487–500 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams a,b,⇑ c a,1 Erik Lewin , Jonathan Counsell , Jörg Patscheider Laboratory for Nanoscale Materials Science, Empa, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland Inorganic Chemistry, Department of Chemistry – Ångström Laboratory, Uppsala university, Box 538, SE-751 21 Uppsala, Sweden Kratos Analytical Ltd, Trafford Wharf Road, Manchester M17 1G, United Kingdom article i nfo abstract Article history: The issue of artefacts due to sputter-etching has been investigated for a group of AlN-based thin film Received 22 August 2017 materials with varying thermodynamical stability. Stability of the materials was controlled by alloying Revised 29 January 2018 AlN with the group 14 elements Si, Ge or Sn in two different concentrations. The coatings were Accepted 19 February 2018 + sputter-etched with monoatomic Ar with energies between 0.2 and 4.0 keV to study the sensitivity of Available online 21 February 2018 the materials for sputter damage. The use of Ar clusters to remove an oxidised surface layer was also http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Precambrian Research Elsevier

Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams

Loading next page...
 
/lp/elsevier/spectral-artefacts-post-sputter-etching-and-how-to-cope-with-them-a-UHCbFRn1dK
Publisher
Elsevier
Copyright
Copyright © 2018 Elsevier B.V.
ISSN
0301-9268
eISSN
1872-7433
D.O.I.
10.1016/j.apsusc.2018.02.191
Publisher site
See Article on Publisher Site

Abstract

Applied Surface Science 442 (2018) 487–500 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams a,b,⇑ c a,1 Erik Lewin , Jonathan Counsell , Jörg Patscheider Laboratory for Nanoscale Materials Science, Empa, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland Inorganic Chemistry, Department of Chemistry – Ångström Laboratory, Uppsala university, Box 538, SE-751 21 Uppsala, Sweden Kratos Analytical Ltd, Trafford Wharf Road, Manchester M17 1G, United Kingdom article i nfo abstract Article history: The issue of artefacts due to sputter-etching has been investigated for a group of AlN-based thin film Received 22 August 2017 materials with varying thermodynamical stability. Stability of the materials was controlled by alloying Revised 29 January 2018 AlN with the group 14 elements Si, Ge or Sn in two different concentrations. The coatings were Accepted 19 February 2018 + sputter-etched with monoatomic Ar with energies between 0.2 and 4.0 keV to study the sensitivity of Available online 21 February 2018 the materials for sputter damage. The use of Ar clusters to remove an oxidised surface layer was also

Journal

Precambrian ResearchElsevier

Published: May 1, 2018

References

You’re reading a free preview. Subscribe to read the entire article.


DeepDyve is your
personal research library

It’s your single place to instantly
discover and read the research
that matters to you.

Enjoy affordable access to
over 12 million articles from more than
10,000 peer-reviewed journals.

All for just $49/month

Explore the DeepDyve Library

Unlimited reading

Read as many articles as you need. Full articles with original layout, charts and figures. Read online, from anywhere.

Stay up to date

Keep up with your field with Personalized Recommendations and Follow Journals to get automatic updates.

Organize your research

It’s easy to organize your research with our built-in tools.

Your journals are on DeepDyve

Read from thousands of the leading scholarly journals from SpringerNature, Elsevier, Wiley-Blackwell, Oxford University Press and more.

All the latest content is available, no embargo periods.

See the journals in your area

Monthly Plan

  • Read unlimited articles
  • Personalized recommendations
  • No expiration
  • Print 20 pages per month
  • 20% off on PDF purchases
  • Organize your research
  • Get updates on your journals and topic searches

$49/month

Start Free Trial

14-day Free Trial

Best Deal — 39% off

Annual Plan

  • All the features of the Professional Plan, but for 39% off!
  • Billed annually
  • No expiration
  • For the normal price of 10 articles elsewhere, you get one full year of unlimited access to articles.

$588

$360/year

billed annually
Start Free Trial

14-day Free Trial