Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams

Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on... Applied Surface Science 442 (2018) 487–500 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams a,b,⇑ c a,1 Erik Lewin , Jonathan Counsell , Jörg Patscheider Laboratory for Nanoscale Materials Science, Empa, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland Inorganic Chemistry, Department of Chemistry – Ångström Laboratory, Uppsala university, Box 538, SE-751 21 Uppsala, Sweden Kratos Analytical Ltd, Trafford Wharf Road, Manchester M17 1G, United Kingdom article i nfo abstract Article history: The issue of artefacts due to sputter-etching has been investigated for a group of AlN-based thin film Received 22 August 2017 materials with varying thermodynamical stability. Stability of the materials was controlled by alloying Revised 29 January 2018 AlN with the group 14 elements Si, Ge or Sn in two different concentrations. The coatings were Accepted 19 February 2018 + sputter-etched with monoatomic Ar with energies between 0.2 and 4.0 keV to study the sensitivity of Available online 21 February 2018 the materials for sputter damage. The use of Ar clusters to remove an oxidised surface layer was also http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Precambrian Research Elsevier

Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams

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Publisher
Elsevier
Copyright
Copyright © 2018 Elsevier B.V.
ISSN
0301-9268
eISSN
1872-7433
D.O.I.
10.1016/j.apsusc.2018.02.191
Publisher site
See Article on Publisher Site

Abstract

Applied Surface Science 442 (2018) 487–500 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams a,b,⇑ c a,1 Erik Lewin , Jonathan Counsell , Jörg Patscheider Laboratory for Nanoscale Materials Science, Empa, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland Inorganic Chemistry, Department of Chemistry – Ångström Laboratory, Uppsala university, Box 538, SE-751 21 Uppsala, Sweden Kratos Analytical Ltd, Trafford Wharf Road, Manchester M17 1G, United Kingdom article i nfo abstract Article history: The issue of artefacts due to sputter-etching has been investigated for a group of AlN-based thin film Received 22 August 2017 materials with varying thermodynamical stability. Stability of the materials was controlled by alloying Revised 29 January 2018 AlN with the group 14 elements Si, Ge or Sn in two different concentrations. The coatings were Accepted 19 February 2018 + sputter-etched with monoatomic Ar with energies between 0.2 and 4.0 keV to study the sensitivity of Available online 21 February 2018 the materials for sputter damage. The use of Ar clusters to remove an oxidised surface layer was also

Journal

Precambrian ResearchElsevier

Published: May 1, 2018

References

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