Solution-processed flexible NiO resistive random access memory device

Solution-processed flexible NiO resistive random access memory device •The direct patterning technique were developed by controlling the pressure and temperature.•The integrated nanoparticle based ReRAM device has simply fabricated on flexible substrate using solution process.•The nanoscale NiO ReRAM were measured and analyzed by c-AFM measurement. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Solid-State Electronics Elsevier

Solution-processed flexible NiO resistive random access memory device

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Publisher
Elsevier
Copyright
Copyright © 2018 Elsevier Ltd
ISSN
0038-1101
eISSN
1879-2405
D.O.I.
10.1016/j.sse.2018.02.006
Publisher site
See Article on Publisher Site

Abstract

•The direct patterning technique were developed by controlling the pressure and temperature.•The integrated nanoparticle based ReRAM device has simply fabricated on flexible substrate using solution process.•The nanoscale NiO ReRAM were measured and analyzed by c-AFM measurement.

Journal

Solid-State ElectronicsElsevier

Published: Apr 1, 2018

References

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