Run-to-run control and performance monitoring of overlay in semiconductor manufacturing

Run-to-run control and performance monitoring of overlay in semiconductor manufacturing In the manufacture of semiconductor products, overlay is one of the most critical design specifications. Overlay is the position of a pattern relative to underlying layers, and overlay control largely determines the minimum feature size that may be incorporated into semiconductor device designs. Overlay control must be performed on a run-to-run basis, i.e. at the end of a run when product characteristics are available, because they cannot be directly measured during a run. In this research a process model and a run-to-run control scheme was developed for overlay control, based on linear model predictive control, and successfully implemented in a commercial facility. Performance monitoring of the closed-loop process was also carried out. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Control Engineering Practice Elsevier

Run-to-run control and performance monitoring of overlay in semiconductor manufacturing

Control Engineering Practice, Volume 12 (7) – Jul 1, 2004

Loading next page...
 
/lp/elsevier/run-to-run-control-and-performance-monitoring-of-overlay-in-aY1Jb7OZlt
Publisher
Elsevier
Copyright
Copyright © 2003 Elsevier Ltd
ISSN
0967-0661
DOI
10.1016/S0967-0661(03)00154-0
Publisher site
See Article on Publisher Site

Abstract

In the manufacture of semiconductor products, overlay is one of the most critical design specifications. Overlay is the position of a pattern relative to underlying layers, and overlay control largely determines the minimum feature size that may be incorporated into semiconductor device designs. Overlay control must be performed on a run-to-run basis, i.e. at the end of a run when product characteristics are available, because they cannot be directly measured during a run. In this research a process model and a run-to-run control scheme was developed for overlay control, based on linear model predictive control, and successfully implemented in a commercial facility. Performance monitoring of the closed-loop process was also carried out.

Journal

Control Engineering PracticeElsevier

Published: Jul 1, 2004

References

You’re reading a free preview. Subscribe to read the entire article.


DeepDyve is your
personal research library

It’s your single place to instantly
discover and read the research
that matters to you.

Enjoy affordable access to
over 18 million articles from more than
15,000 peer-reviewed journals.

All for just $49/month

Explore the DeepDyve Library

Search

Query the DeepDyve database, plus search all of PubMed and Google Scholar seamlessly

Organize

Save any article or search result from DeepDyve, PubMed, and Google Scholar... all in one place.

Access

Get unlimited, online access to over 18 million full-text articles from more than 15,000 scientific journals.

Your journals are on DeepDyve

Read from thousands of the leading scholarly journals from SpringerNature, Elsevier, Wiley-Blackwell, Oxford University Press and more.

All the latest content is available, no embargo periods.

See the journals in your area

DeepDyve

Freelancer

DeepDyve

Pro

Price

FREE

$49/month
$360/year

Save searches from
Google Scholar,
PubMed

Create folders to
organize your research

Export folders, citations

Read DeepDyve articles

Abstract access only

Unlimited access to over
18 million full-text articles

Print

20 pages / month

PDF Discount

20% off