Negative ion formation through dissociative electron attachment to the group IV tetrachlorides: Carbon tetrachloride, silicon tetrachloride and germanium tetrachloride

Negative ion formation through dissociative electron attachment to the group IV tetrachlorides:... Article history: The current contribution constitutes the third and final part of our trilogy of papers on electron attachment Received 26 September 2017 reactions of the group IV tetrahalides; XY (X = C, Si, Ge and Y = F, Cl, Br). In this context we extend our Received in revised form previous studies on XF and XBr and report results for electron attachment to the tetrachlorides: CCl , 4 4 4 28 December 2017 SiCl and GeCl in the incident electron energy range from about 0 to 10 eV. At the same time we give a 4 4 Accepted 1 January 2018 summary of the currently available literature on electron interactions with those latter compounds. Upon Available online 2 January 2018 − − − − electron attachment the formation of Cl , XCl , XCl and Cl is observed from all the tetrachlorides, 3 2 2 and additionally the molecular anion SiCl is observed from SiCl . The main DEA contributions are 4 4 Keywords: observed through narrow, threshold peaks (at 0 eV) and we attribute these features to single particle Dissociative electron attachment resonances associated with the a symmetry LUMOs of those compounds. Contributions from another Electron scattering http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png International Journal of Mass Spectrometry Elsevier

Negative ion formation through dissociative electron attachment to the group IV tetrachlorides: Carbon tetrachloride, silicon tetrachloride and germanium tetrachloride

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Publisher
Elsevier
Copyright
Copyright © 2018 Elsevier B.V.
ISSN
1387-3806
eISSN
1873-2798
D.O.I.
10.1016/j.ijms.2018.01.001
Publisher site
See Article on Publisher Site

Abstract

Article history: The current contribution constitutes the third and final part of our trilogy of papers on electron attachment Received 26 September 2017 reactions of the group IV tetrahalides; XY (X = C, Si, Ge and Y = F, Cl, Br). In this context we extend our Received in revised form previous studies on XF and XBr and report results for electron attachment to the tetrachlorides: CCl , 4 4 4 28 December 2017 SiCl and GeCl in the incident electron energy range from about 0 to 10 eV. At the same time we give a 4 4 Accepted 1 January 2018 summary of the currently available literature on electron interactions with those latter compounds. Upon Available online 2 January 2018 − − − − electron attachment the formation of Cl , XCl , XCl and Cl is observed from all the tetrachlorides, 3 2 2 and additionally the molecular anion SiCl is observed from SiCl . The main DEA contributions are 4 4 Keywords: observed through narrow, threshold peaks (at 0 eV) and we attribute these features to single particle Dissociative electron attachment resonances associated with the a symmetry LUMOs of those compounds. Contributions from another Electron scattering

Journal

International Journal of Mass SpectrometryElsevier

Published: Mar 1, 2018

References

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