Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition

Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor... Applied Surface Science 442 (2018) 529–536 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition Xuejie Liu , Pengfei Lu, Hongchao Wang, Yuan Ren, Xin Tan, Shiyang Sun, Huiling Jia School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou, Inner Mongolia 014010, People’s Republic of China article i nfo abstract Article history: Ti-doped diamond films were deposited through a microwave plasma chemical vapor deposition Received 11 September 2017 (MPCVD) system for the first time. The effects of the addition of Ti on the morphology, microstructure Revised 15 February 2018 and quality of diamond films were systematically investigated. Secondary ion mass spectrometry results Accepted 18 February 2018 show that Ti can be added to diamond films through the MPCVD system using tetra n-butyl titanate as Available online 20 February 2018 precursor. The spectra from X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy and the images from scanning electron microscopy of the deposited films indicate that the diamond Keywords: phase clearly exists and dominates in Ti-doped diamond films. The amount of Ti added obviously influ- Ti-doped diamond films ences http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Precambrian Research Elsevier

Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition

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Publisher
Elsevier
Copyright
Copyright © 2018 Elsevier B.V.
ISSN
0301-9268
eISSN
1872-7433
D.O.I.
10.1016/j.apsusc.2018.02.180
Publisher site
See Article on Publisher Site

Abstract

Applied Surface Science 442 (2018) 529–536 Contents lists available at ScienceDirect Applied Surface Science journal homepage: www.elsevier.com/locate/apsusc Full Length Article Morphology and structure of Ti-doped diamond films prepared by microwave plasma chemical vapor deposition Xuejie Liu , Pengfei Lu, Hongchao Wang, Yuan Ren, Xin Tan, Shiyang Sun, Huiling Jia School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou, Inner Mongolia 014010, People’s Republic of China article i nfo abstract Article history: Ti-doped diamond films were deposited through a microwave plasma chemical vapor deposition Received 11 September 2017 (MPCVD) system for the first time. The effects of the addition of Ti on the morphology, microstructure Revised 15 February 2018 and quality of diamond films were systematically investigated. Secondary ion mass spectrometry results Accepted 18 February 2018 show that Ti can be added to diamond films through the MPCVD system using tetra n-butyl titanate as Available online 20 February 2018 precursor. The spectra from X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy and the images from scanning electron microscopy of the deposited films indicate that the diamond Keywords: phase clearly exists and dominates in Ti-doped diamond films. The amount of Ti added obviously influ- Ti-doped diamond films ences

Journal

Precambrian ResearchElsevier

Published: May 1, 2018

References

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