Improving the ALD-grown Y2O3/Ge interface quality by surface and annealing treatments

Improving the ALD-grown Y2O3/Ge interface quality by surface and annealing treatments •Investigation of interfacial mechanisms for hydrofluoric and thermal pre-treated Ge-surfaces.•Improvement of interface trap density due to proper annealing treatments.•Further improvement of interfacial and electrical properties due to catalytic acting thin platinum layer. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Applied Surface Science Elsevier

Improving the ALD-grown Y2O3/Ge interface quality by surface and annealing treatments

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Publisher
Elsevier
Copyright
Copyright © 2016 Elsevier B.V.
ISSN
0169-4332
eISSN
1873-5584
D.O.I.
10.1016/j.apsusc.2016.02.066
Publisher site
See Article on Publisher Site

Abstract

•Investigation of interfacial mechanisms for hydrofluoric and thermal pre-treated Ge-surfaces.•Improvement of interface trap density due to proper annealing treatments.•Further improvement of interfacial and electrical properties due to catalytic acting thin platinum layer.

Journal

Applied Surface ScienceElsevier

Published: Apr 30, 2016

References

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