Chemical ionization mass spectrometry of hydrofluorocarbons, hydrofluorocarbon ethers and perfluoroalkenes

Chemical ionization mass spectrometry of hydrofluorocarbons, hydrofluorocarbon ethers and... Positive and negative chemical ionization (CI) mass spectrometry is studied for hydrofluorocarbons (HFCs), hydrofluorocarbon ethers (HFEs), and perfluoroalkenes (PFCs) using various kinds of reagent gas. While no quasi-molecular ion was observed under electron impact ionization for saturated MFCs, (M-F) + is detected under CI conditions using methane as a reagent gas. Mechanisms for the generation of (M-F) + are discussed. Furthermore, nitrogen monoxide can be used as a reagent gas to observe (M + NO) + for many HFCs and HFEs. In negative mode chloroform is also available to generate (M + Cl) − for HFCs and HFEs containing -CHF- groups. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Fluorine Chemistry Elsevier

Chemical ionization mass spectrometry of hydrofluorocarbons, hydrofluorocarbon ethers and perfluoroalkenes

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Publisher
Elsevier
Copyright
Copyright © 1996 Elsevier scince S.A.
ISSN
0022-1139
eISSN
1873-3328
DOI
10.1016/S0022-1139(96)03499-9
Publisher site
See Article on Publisher Site

Abstract

Positive and negative chemical ionization (CI) mass spectrometry is studied for hydrofluorocarbons (HFCs), hydrofluorocarbon ethers (HFEs), and perfluoroalkenes (PFCs) using various kinds of reagent gas. While no quasi-molecular ion was observed under electron impact ionization for saturated MFCs, (M-F) + is detected under CI conditions using methane as a reagent gas. Mechanisms for the generation of (M-F) + are discussed. Furthermore, nitrogen monoxide can be used as a reagent gas to observe (M + NO) + for many HFCs and HFEs. In negative mode chloroform is also available to generate (M + Cl) − for HFCs and HFEs containing -CHF- groups.

Journal

Journal of Fluorine ChemistryElsevier

Published: Oct 1, 1996

References

  • Electron Impact Phenomena and the Properties of Gaseous Ions
    Field, F.H.; Franklin, J.L.

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