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- Publisher
- Wiley
- Copyright
- Copyright © 2007 John Wiley & Sons, Ltd.
- ISSN
- 0142-2421
- eISSN
- 1096-9918
- DOI
- 10.1002/sia.2569
- Publisher site
- See Article on Publisher Site
Abstract
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300–600 °C, for 8 h. The as‐deposited and annealed thin films were characterized by Rutherford backscattering spectroscopy, nuclear reaction analysis, Auger electron spectroscopy, X‐ray diffraction, scanning electron microscopy and atomic force microscopy. The electrochemical behavior of the various films was studied by the galvanostatic method. The cells were tested in a liquid electrolyte at room temperature, with lithium metal used as the counter and reference electrode. The best electrochemical storage value was obtained with the thin film annealed at 300 °C, which showed superior capacity and small capacity loss during cycling. Copyright © 2007 John Wiley & Sons, Ltd.
Journal
Surface and Interface Analysis – Wiley
Published: Aug 1, 2007