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A new model for the diffusion of arsenic in polycrystalline silicon

A new model for the diffusion of arsenic in polycrystalline silicon http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Applied Physics CrossRef

A new model for the diffusion of arsenic in polycrystalline silicon

Journal of Applied Physics , Volume 64 (1): 167-174 – Jul 1, 1988
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Publisher
CrossRef
ISSN
0021-8979
DOI
10.1063/1.341450
Publisher site
See Article on Publisher Site

Abstract

Journal

Journal of Applied PhysicsCrossRef

Published: Jul 1, 1988

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