“Woah! It's like Spotify but for academic articles.”

Instant Access to Thousands of Journals for just $40/month

Interface formation during molecular beam epitaxial growth of neodymium oxide on silicon

Interface formation during molecular beam epitaxial growth of neodymium oxide on silicon The Si/dielectric interface properties influence device performance significantly. Often the interface is not stable and changes during and/or after the growth. For a better understanding of the interface and layer formation processes of Nd 2 O 3 Nd 2 O 3 on Si(001), as an example for the lanthanide oxides, well-defined experimental studies by reflection high-energy diffraction and x-ray photoelectron spectroscopy were performed under ultraclean ultrahigh vacuum conditions of molecular beam epitaxy. Complementary investigations were performed by transmission electron microscopy. We found that Nd 2 O 3 Nd 2 O 3 is a candidate for replacing silicon dioxide as gate dielectric in future Si devices with suitable band gap and offset with respect to silicon. However, under ultrahigh vacuum conditions, silicide formation occurs in the initial stage of growth, which can result in large silicide inclusions and hole formation during further growth. This effect can be completely prevented by modifying the oxygen partial pressure during the interface formation and layer growth. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Applied Physics American Institute of Physics
Loading next page...
 
/lp/american-institute-of-physics/interface-formation-during-molecular-beam-epitaxial-growth-of-harqcxf0NZ

You're reading a free preview. Subscribe to read the entire article.

And millions more from thousands of peer-reviewed journals, for just $40/month

Get 2 Weeks Free

To be the best researcher, you need access to the best research

  • With DeepDyve, you can stop worrying about how much articles cost, or if it's too much hassle to order — it's all at your fingertips. Your research is important and deserves the top content.
  • Read from thousands of the leading scholarly journals from Springer, Elsevier, Nature, IEEE, Wiley-Blackwell and more.
  • All the latest content is available, no embargo periods.

Stop missing out on the latest updates in your field

  • We’ll send you automatic email updates on the keywords and journals you tell us are most important to you.
  • There is a lot of content out there, so we help you sift through it and stay organized.