%0 Journal Article
%T Kinetics and modes of plasmachemical etching of GaAs under conditions of induction HF discharge in CF2Cl2
%A Efremov, A.
%A Murin, D.
%A Leventsov, A.
%J Russian Microelectronics
%V 43
%N 6
%P 401-406
%@ 1063-7397
%D 2014-11-12
%I Pleiades Publishing
%~ DeepDyve