%0 Journal Article
%T Kinetics and modes of plasmachemical etching of GaAs under conditions of induction HF discharge in CF2Cl2
%A Efremov, A.
%A Murin, D.
%A Leventsov, A.
%J Russian Microelectronics
$V 43
%N 6
%P 401-406
%@ 1063-7397
%D 2014
%I Pleiades Publishing