TY - JOUR AU - Zhao, Lixin AB - Traditional electro-deposition techniques turn out ineffective in removing excessive arsenic (As) impurities and may result in the disqualification of high-purity copper (Cu) products while dealing with high As-bearing Cu electrolytes. This study focused on the following two aspects: First, the cryogenic cooling crystallization and acid supplementation for purified copper were investigated; second, the factors affecting the removal of As impurities from the electrolyte were studied in combination with electrolysis at the optimal copper-to-arsenic mass concentration (Cu/As) ratio. Below are the optimal conditions determined for electrolysis of As, with Cu as the cathode material: The Cu/As ratio of the electrolyte can be lowered to 0.25 by increasing the acid concentration to 370 g/l and crystallizing Cu precipitation by cooling down to 10 °C. During electrolysis, optimal Cu/As ratio of 0.01–0.05, sulfuric acid (H2SO4) concentration of 230 g/l, and current density of 500 A/m2, the maximum removal rate of arsenic is up to 45%, the Cu-As alloy gradually took shape, with the main species being Cu3As, achieving high efficiency arsenic removal. A cryogenic crystallization and Cu reduction procedure was proposed coupled with multipoint feeding electrorefining and As removal.Graphical Abstract[graphic not available: see fulltext] TI - Deep Electrochemical Purification of High Arsenic-Bearing Copper Refined Electrolyte JF - Journal of Sustainable Metallurgy DO - 10.1007/s40831-023-00652-x DA - 2023-03-01 UR - https://www.deepdyve.com/lp/springer-journals/deep-electrochemical-purification-of-high-arsenic-bearing-copper-tAnB45Los0 SP - 398 EP - 407 VL - 9 IS - 1 DP - DeepDyve ER -